Product Detail
Electro Deionization (EDI) Unit
A continuous, chemical-free polishing process to deliver ultrapure water — no regeneration chemicals, no downtime.
NERITH EDI System
Design Highlights
< 1500ppm
Feed water TDS
< 15µS/cm²
RO conductivity
18.2MΩ·cm
EDI product resistivity
< 1µS/cm³
EDI product conductivity
Operating & Feed Water Limits
Know your feed water.
pH4 – 11
Inlet Feed Pressure0 – 7 Bar
TemperatureMax 113 (45) °F (°C)
Feed Equiv. Conductivity (FCE)< 15 µS/cm²
Total Chlorine< 0.002 ppm
Iron (Fe)< 0.01 ppm
Sulphate (SO4)< 0.001 ppm
Total Hardness< 1 ppm
Total Organic Compound (TOC)< 0.05 ppm
Silica (SiO2)< 0.05 ppm
FCE measured including SiO2 & CO2. Values represent maximum feed-water limits unless noted. Specifications subject to change without notice.
Where EDI Is Used
Ultrapure water, six ways.
Pharmaceutical & Biotech
USP purified & injectable-grade water.
Power & Boiler Feed
High-purity make-up water for boilers & turbines.
Electronics & Semiconductor
Ultrapure rinse water for wafer & PCB fabrication.
Laboratories & Research
Reagent-grade water for analytics & testing.
Food & Beverage
Consistent process & ingredient water.
Cosmetics & Chemicals
Deionized water for formulation & processing.
Need ultrapure water?
Send us your feed water analysis and target resistivity — we'll design the train.